Tomoya Kumagai
33Patents
8h-index
57Co-inventors
78Inventor score
Filing activity: Jul 26, 2002 → Jul 6, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD663324S1 | Excavator | General | 22 | Active |
| USD663751S1 | Excavator | General | 18 | Active |
| US9979916B2 | Imaging apparatus and imaging system | Electricity | 15 | Active |
| USD663327S1 | Excavator cabin | General | 14 | Active |
| USD538303S1 | Bulldozer | General | 11 | Expired |
| USD552629S1 | Bulldozer | General | 10 | Expired |
| USD688712S1 | Main body of a construction machine | General | 8 | Active |
| USD697089S1 | Main body of a construction machine | General | 8 | Active |
| USD543557S1 | Bulldozer | General | 7 | Expired |
| USD777602S1 | Dump truck | General | 7 | Active |
| US10742905B2 | Imaging device and method of driving imaging device | Emerging Cross-Sectional Technologies | 6 | Active |
| USD551683S1 | Bulldozer | General | 5 | Expired |
| US11303830B2 | Photoelectric conversion device and imaging system | Electricity | 4 | Active |
| USD489040S1 | Hand-operated switch | General | 4 | Expired |
| US11284032B2 | Imaging device, semiconductor device and camera | Electricity | 3 | Active |
| US9920286B2 | Cleaning liquid for lithography and method for forming wiring | Electricity | 2 | Active |
| US8367312B2 | Detergent for lithography and method of forming resist pattern with the same | Physics | 2 | Active |
| US8349549B2 | Resist surface modifying liquid, and method for formation of resist pattern using the same | Physics | 2 | Active |
| US9796953B2 | Cleaning liquid for lithography and method for cleaning substrate | Chemistry; Metallurgy | 1 | Active |
| US9063430B2 | Coating agent for forming fine pattern | Chemistry; Metallurgy | 1 | Active |
| US9417532B2 | Coating agent for forming fine pattern | Physics | 0 | Active |
| US11119410B2 | Cleaning liquid, and method of cleaning substrate provided with metal resist | Chemistry; Metallurgy | 0 | Active |
| US9964851B2 | Resist pattern forming method and developer for lithography | Physics | 0 | Active |
| US12428737B2 | Cleaning liquid used for cleaning metal resists, and cleaning method using cleaning liquid | Chemistry; Metallurgy | 0 | Active |
| US9291905B2 | Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.