Measurement apparatus and method for predicting aberrations in a projection system
US11126091B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Jan 28, 2019 |
| Grant date | Sep 21, 2021 |
| Priority date | — |
| Expiry date | Jan 28, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of calibrating a projection system heating model to predict an aberration in a projection system in a lithographic apparatus, the method comprising passing exposure radiation through a projection system to expose one or more exposure fields on a substrate provided on a substrate table, making measurements of the aberration in the projection system caused by the exposure radiation, wherein the time period between measurements is less than the time period that would be taken to expose all exposure fields on the substrate.
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