Patent · US Active

Back end of the line metal structure and method

US11127674B2 · kind B2 · utility

0Cited by

7References

20Claims

0Family size

Assignee

GLOBALFOUNDRIES U.S. Inc. · US

Inventors

Dirk Breuer · Dresden, DE
Oliver Witnik · Radebeul, DE
Carla Byloos · Dresden, DE
Holger Schuehrer · Dresden, DE

Key dates

Filing date	Oct 16, 2019
Grant date	Sep 21, 2021
Priority date	—
Expiry date	Oct 16, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH01L23/53228
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Disclosed are embodiments of a back end of the line (BEOL) metal structure that includes, within a metal level, a metal via, which has at least eight sides and all interior angles at 135° or more, and a metal wire thereon. The metal wire and via include respective portions of a continuous conformal metal layer. A passivation layer coats the top surface of the metal layer. The metal via and the metal wire thereon can be in an upper metal level and can be made of one metal (e.g., aluminum or an aluminum alloy). The upper metal level can be above a lower metal level that similarly includes a metal via and metal wire thereon, but the metal used can be different (e.g., copper) and/or the shape of the via can be different (e.g., four-sided). Also disclosed herein are method embodiments for forming the above-described BEOL metal structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.