Apparatus and methods for measuring phase and amplitude of light through a layer
US11131629B2 · kind B2 · utility
2Cited by
8References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2018 |
| Grant date | Sep 28, 2021 |
| Priority date | — |
| Expiry date | Aug 19, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/95676
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In one embodiment, disclosed are apparatus, methods, and targets for determining a phase shift of a photomask having a phase-shift target. An inspection or metrology system is used to direct an incident beam towards the target and then detect a plurality of intensity measurements that are transmitted through the target in response to the incident beam. A phase shift value for the target may then be determined based on the intensity measurements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.