Multiple electron beams irradiation apparatus
US11139138B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 5, 2020 |
| Grant date | Oct 5, 2021 |
| Priority date | — |
| Expiry date | Mar 5, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2448
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multiple electron beam irradiation apparatus includes a forming mechanism which forms multiple primary electron beams; a plurality of electrode substrates being stacked in each of which a plurality of openings of various diameter dimensions are formed, the plurality of openings being arranged at passage positions of the multiple primary electron beams, and through each of which a corresponding one of the multiple primary electron beams passes, the plurality of electrode substrates being able to adjust an image plane conjugate position of each of the multiple primary electron beams depending on a corresponding one of the various diameter dimensions; and a stage which is capable of mounting thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.