Flow control system, method, and apparatus
US11144075B2 · kind B2 · utility
3Cited by
215References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2020 |
| Grant date | Oct 12, 2021 |
| Priority date | — |
| Expiry date | Sep 21, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and a first outlet port, the first inlet port being fluidly coupled to the gas inlet of the monolithic base. The third flow component mounting region has a first sensing port fluidly coupled to the gas outlet of the monolithic base.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.