Electron source and production method therefor
US11152185B2 · kind B2 · utility
0Cited by
5References
11Claims
0Family size
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Key dates
| Filing date | Feb 17, 2021 |
| Grant date | Oct 19, 2021 |
| Priority date | — |
| Expiry date | Feb 17, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/06341
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron source capable of suppressing consumption of an electron emission material is provide. The present invention provides an electron source including: an electron emission material; and, an electron emission-suppressing material covering a side surface of the electron emission material, wherein a work function of the electron emission-suppressing material is higher than that of the electron emission material, and a thermal emissivity of the electron emission-suppressing material is lower than that of the electron emission material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.