Film forming composition and film forming method using the same
US11161982B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Apr 3, 2018 |
| Grant date | Nov 2, 2021 |
| Priority date | — |
| Expiry date | Aug 12, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L2205/02
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
[Problem] To provide a film forming composition and a film forming method capable of forming a film excellent in gas barrier properties. [Means for Solution] A film forming composition comprising a polysilazane, an organic solvent and an additive having a specific structure, and a film forming method comprising applying the composition on a substrate and exposing the composition to light. This specific additive is represented by a specific general formula among those having a nonconjugated cyclic structure composed of atoms selected from the group consisting of carbon, nitrogen and oxygen in the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.