Quartz glass crucible, manufacturing method thereof, and manufacturing method of silicon single crystal using quartz glass crucible
US11162186B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 2017 |
| Grant date | Nov 2, 2021 |
| Priority date | — |
| Expiry date | Mar 26, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B15/002
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In an exemplary embodiment, a quartz glass crucible 1 includes: a cylindrical crucible body 10 which has a bottom and is made of quartz glass; and a first crystallization-accelerator-containing coating film 13A which is formed on an inner surface 10a so as to cause an inner crystal layer composed of an aggregate of dome-shaped or columnar crystal grains to be formed on a surface-layer portion of the inner surface 10a of the crucible body 10 by heating during a step of pulling up the silicon single crystal by a Czochralski method. The quartz glass crucible is capable of withstanding a single crystal pull-up step undertaken for a very long period of time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.