Patent · US Active

Low repetition rate infrared tunable femtosecond laser source

US11165218B2 · kind B2 · utility

0Cited by

2References

37Claims

0Family size

Assignee

MKS Instruments, Inc. · US

Inventors

James D. Kafka · Palo Alto, US
Ching-Yuan Chien · Palo Alto, US
Andrei C. Florean · Menlo Park, US
Travis Petersen · San Jose, US
Alan Petersen · Palo Alto, US

Key dates

Filing date	Jan 31, 2020
Grant date	Nov 2, 2021
Priority date	—
Expiry date	Apr 21, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01S3/302
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The present application discloses a cavity dumped low repetition rate infrared tunable femtosecond laser source configured to produce pulses of 200 femtoseconds or less with a peak power of four megawatts or more for use in a variety of applications including multi-photon microscopy.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.