Patent · US Active

Susceptor for a chemical vapour deposition reactor

US11168410B2 · kind B2 · utility

1Cited by

8References

18Claims

0Family size

Assignee

AIXTRON SE · DE

Inventors

Daniel Claessens · Aachen, DE
Adam Boyd · Kelmis, BE
James G. O'Dowd · Levittown, US
Olivier Feron · Gemmenich, BE

Key dates

Filing date	Aug 22, 2017
Grant date	Nov 9, 2021
Priority date	—
Expiry date	Jan 28, 2038

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/68771
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A susceptor for a CVD-reactor includes insertion openings arranged in a bearing surface of the susceptor. An insertion section of a positioning element is inserted into one of the insertion openings. The insertion section forms positioning flanks with a section projecting from the insertion opening for fixing the position of a substrate. The insertion openings each have side walls and a base. The insertion section comprises bearing areas adjacent to the side walls of the insertion openings and a lower side of the positioning element facing the base of the insertion opening. The base of the insertion opening is separated from the lower side of the positioning element by a first distance. An edge protruding section of the positioning element is separated from a section of the bearing surface of the susceptor by a second distance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.