Patent · US Active

Gallium arsenide substrate comprising a surface oxide layer with improved surface homogeneity

US11170989B2 · kind B2 · utility

1Cited by

3References

5Claims

0Family size

Assignee

FREIBERGER COMPOUND MATERIALS GMBH · DE

Inventors

Wolfram Fliegel · Dresden, DE
Christoph Klement · Chemnitz, DE
Christa Willnauer · Dorfhain, DE
Max Scheffer-Czygan · Chemnitz, DE
André Kleinwechter · Freiberg, DE
Stefan Eichler · Dresden, DE
Berndt Weinert · Freiberg, DE
Michael Mäder · Coswig, DE

Key dates

Filing date	Feb 1, 2018
Grant date	Nov 9, 2021
Priority date	—
Expiry date	May 6, 2038

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24355
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The present invention relates to a novel provided gallium arsenide substrates as well as the use thereof. The gallium arsenide substrates provided according to the invention exhibit a so far not obtained surface quality, in particular a homogeneity of surface properties, which is detectable by means of optical surface analyzers, by way of example by means of ellipsometric lateral substrate mapping for optical contact-free quantitative characterization.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.