Patent · US Active

Surface treatment compositions and articles containing same

US11174394B2 · kind B2 · utility

0Cited by
18References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 18, 2018
Grant dateNov 16, 2021
Priority date
Expiry dateDec 18, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/3105
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

This disclosure relates to methods and compositions for treating a wafer having a pattern disposed on a surface of the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.