Patent · US Active

Method of building a 3D functional optical material layer stacking structure

US11187836B2 · kind B2 · utility

0Cited by
4References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 5, 2019
Grant dateNov 30, 2021
Priority date
Expiry dateMay 31, 2039

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03H2260/63
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a substrate without planarization. The method includes depositing a material stack to be patterned on a substrate, depositing and patterning a thick mask material on a portion of the material stack, etching the material stack down one level, trimming a side portion of the thick mask material, etching the material stack down one more level, repeating trim and etch steps above ‘n’ times, and stripping the thick mask material from the material stack.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.