Method of building a 3D functional optical material layer stacking structure
US11187836B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2019 |
| Grant date | Nov 30, 2021 |
| Priority date | — |
| Expiry date | May 31, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2260/63
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a substrate without planarization. The method includes depositing a material stack to be patterned on a substrate, depositing and patterning a thick mask material on a portion of the material stack, etching the material stack down one level, trimming a side portion of the thick mask material, etching the material stack down one more level, repeating trim and etch steps above ‘n’ times, and stripping the thick mask material from the material stack.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.