Compensation optical system for an interferometric measuring system
US11199396B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2020 |
| Grant date | Dec 14, 2021 |
| Priority date | — |
| Expiry date | Mar 28, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/30
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A compensation optical unit (30) for a measurement system (10) for determining a shape of an optical surface (12) of a test object (14) by interferometry generates a measuring wave (44), directed at the test object, with a wavefront that is at least partly adapted to a target shape of the optical surface from an input wave (18). The unit includes first (32) and second (34) optical elements disposed in a beam path of the input wave. The second optical element is a diffractive optical element configured to split the input wave into the measuring wave and a reference wave (42) following an interaction with the first optical element. At least 20% of a refractive power of the entire compensation optical unit is allotted to the first optical element, and this allotted refractive power has the same sign as the refractive power of the entire compensation optical unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.