Methods of forming an apparatus including device structures including pillar structures, and related memory devices, and electronic systems
US11201154B2 · kind B2 · utility
1Cited by
10References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2019 |
| Grant date | Dec 14, 2021 |
| Priority date | — |
| Expiry date | Mar 11, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B12/488
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of forming an apparatus comprises forming pillar structures extending from a base material. Upper portions of the pillar structures may exhibit a lateral width that is relatively greater than a lateral width of lower portions of the pillar structures. The method also comprises forming access lines laterally adjacent to the lower portions of the pillar structures and forming digit lines above upper surfaces of the pillar structures. Memory devices and electronic systems are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.