High stability collimator assembly, lithographic apparatus, and method
US11204559B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 2, 2019 |
| Grant date | Dec 21, 2021 |
| Priority date | — |
| Expiry date | May 2, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B7/008
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography system comprises an illumination system configured to produce abeam of radiation, a support configured to support a patterning device configured to impart a pattern on the beam, a projection system configured to project the patterned beam onto a substrate, and an alignment system comprising an illuminator. The illuminator comprises an optical fiber, an optical fiber protector (714), an optical fiber support (700) comprising a first support arm assembly configured to support the optical fiber protector, an optical system, and an optical system support comprising a second support arm assembly configured to support the optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.