Patent · US Active

Performance optimized scanning sequence for eBeam metrology and inspection

US11209737B1 · kind B1 · utility

3Cited by

9References

24Claims

0Family size

Assignee

KLA Corporation · US

Inventors

Henning Stoschus · Wetzlar, DE
Stefan Eyring · Weilburg, DE
Ulrich Pohlmann · Jena, DE
Inna Steely-Tarshish · Haifa, IL
Nadav Gutman · Zichron Ya'akov, IL

Key dates

Filing date	Jun 30, 2020
Grant date	Dec 28, 2021
Priority date	—
Expiry date	Jun 30, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30168
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A metrology system may include a characterization tool configured to generate metrology data for a sample based on the interaction of an illumination beam with the sample, and may also include one or more adjustable measurement parameters to control the generation of metrology data. The metrology system may include one or more processors that may receive design data associated with a plurality of regions of interest for measurement, select individualized measurement parameters of the characterization tool for the plurality of regions of interest, and direct the characterization tool to characterize the plurality of regions of interest based on the individualized measurement parameters.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.