Ulrich Pohlmann
10Patents
3h-index
23Co-inventors
56Inventor score
Filing activity: Sep 9, 2009 → Jun 1, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10473460B2 | Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals | Electricity | 15 | Active |
| US10474040B2 | Systems and methods for device-correlated overlay metrology | Electricity | 3 | Active |
| US11209737B1 | Performance optimized scanning sequence for eBeam metrology and inspection | Physics | 3 | Active |
| US9851643B2 | Apparatus and methods for reticle handling in an EUV reticle inspection tool | Physics | 3 | Active |
| US8125653B2 | Apparatus and method for the determination of the position of a disk-shaped object | Electricity | 1 | Active |
| US11862524B2 | Overlay mark design for electron beam overlay | Electricity | 1 | Active |
| US11637030B2 | Multi-stage, multi-zone substrate positioning systems | Electricity | 0 | Active |
| US11720031B2 | Overlay design for electron beam and scatterometry overlay measurements | Physics | 0 | Active |
| US11703767B2 | Overlay mark design for electron beam overlay | Physics | 0 | Active |
| US12055859B2 | Overlay mark design for electron beam overlay | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.