Water soluble organic-inorganic hybrid mask formulations and their applications
US11211247B2 · kind B2 · utility
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42References
14Claims
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Key dates
| Filing date | Jan 30, 2020 |
| Grant date | Dec 28, 2021 |
| Priority date | — |
| Expiry date | Feb 29, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/038
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Water soluble organic-inorganic hybrid masks and mask formulations, and methods of dicing semiconductor wafers are described. In an example, a mask for a wafer singulation process includes a water-soluble matrix based on a solid component and water. A p-block metal compound, an s-block metal compound, or a transition metal compound is dissolved throughout the water-soluble matrix.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.