Apparatus and method for generating extreme ultraviolet radiation
US11212903B2 · kind B2 · utility
1Cited by
16References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 26, 2019 |
| Grant date | Dec 28, 2021 |
| Priority date | — |
| Expiry date | Nov 13, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. A deformable mirror is disposed in a path of the excitation laser. A controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.