Narrow etched gaps or features in multi-period thin-film structures
US11222676B2 · kind B2 · utility
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26Claims
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Key dates
| Filing date | Jul 21, 2020 |
| Grant date | Jan 11, 2022 |
| Priority date | — |
| Expiry date | Jul 21, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2005/3996
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Multi-period thin-film structures exhibiting giant magnetoresistance (GMR) are described. Techniques are also described by which narrow spacing and/or feature size may be achieved for such structures and other thin-film structures having an arbitrary number of periods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.