Position detection apparatus, exposure apparatus, and article manufacturing method
US11231573B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 23, 2020 |
| Grant date | Jan 25, 2022 |
| Priority date | — |
| Expiry date | Mar 23, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Position detection apparatus includes illumination optical system for illuminating target, detection optical system for forming image of the illuminated target illuminated on photoelectric converter, first array having first aperture stops, second array having second aperture stops, first driving mechanism for arranging the selected first aperture stop on pupil of the illumination optical system by driving the first array such that first aperture stop crossing optical axis of the illumination optical system moves in first direction, second driving mechanism for arranging the selected second aperture stop on pupil of the detection optical system by driving the second array such that second aperture stop crossing optical axis of the detection optical system moves in second direction. The first and second driving mechanisms fine-tune positions of the selected first and second aperture stops in the first and second directions, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.