Capacitor structure and method of forming the same
US11232825B2 · kind B2 · utility
0Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2019 |
| Grant date | Jan 25, 2022 |
| Priority date | — |
| Expiry date | Jun 2, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C5/145
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A capacitor is provided. The capacitor includes a substrate that has opposing first and second main surfaces. The capacitor also includes at least two conductive plates that are formed in the substrate and extend from the first main surface to the second main surface of the substrate. The capacitor further includes at least one insulating structure that is formed between two adjacent conductive plates of the at least two conductive plates and extends from the first main surface to the second main surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.