Patent · US Active

Sputtering apparatus

US11251020B2 · kind B2 · utility

0Cited by
3References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 14, 2018
Grant dateFeb 15, 2022
Priority date
Expiry dateJul 5, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/3408
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The apparatus includes: a vacuum container; a substrate-holding part inside the vacuum container; a target-holding part inside the vacuum container; and a plurality of antennas having a flow channel through which a cooling liquid flows. The antennas include: at least two tubular conductor elements; a tubular insulating element that is arranged between mutually adjacent conductor elements and insulates the conductor elements; and a capacitive element that is connected electrically in series to the mutually adjacent conductor elements. The capacitive element includes: a first electrode which is connected electrically to one of the mutually adjacent conductor elements; a second electrode which is connected electrically to the other of the mutually adjacent conductor elements and is disposed facing the first electrode; and a dielectric substance that fills the space between the first electrode and the second electrode. The dielectric substance is a cooling liquid.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.