Process for fabricating an optoelectronic device for emitting infrared light comprising a GeSn-based active layer
US11251339B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Sep 26, 2019 |
| Grant date | Feb 15, 2022 |
| Priority date | — |
| Expiry date | Sep 26, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/872
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for fabricating an optoelectronic device for emitting infrared radiation, including:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.