Patent · US Active

Apparatus and method for repairing a photolithographic mask

US11256168B2 · kind B2 · utility

0Cited by

3References

16Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Michael Budach · Hanau, DE
Ottmar Hoinkis · Darmstadt, DE

Key dates

Filing date	Jan 29, 2020
Grant date	Feb 22, 2022
Priority date	—
Expiry date	Jan 29, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31744
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The present application relates to an apparatus for processing a photolithographic mask, said apparatus comprising: (a) at least one time-varying particle beam, which is embodied for a local deposition reaction and/or a local etching reaction on the photolithographic mask; (b) at least one first means for providing at least one precursor gas, wherein the precursor gas is embodied to interact with the particle beam during the local deposition reaction and/or the local etching reaction; and (c) at least one second means, which reduces a mean angle of incidence (φ) between the time-varying particle beam and a surface of the photolithographic mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.