Michael Budach
26Patents
3h-index
28Co-inventors
59Inventor score
Filing activity: Sep 19, 2007 → Jun 23, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7645989B2 | Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof | Electricity | 7 | Active |
| US8247782B2 | Apparatus and method for investigating and/or modifying a sample | Electricity | 5 | Active |
| US9336983B2 | Scanning particle microscope and method for determining a position change of a particle beam of the scanning particle microscope | Electricity | 4 | Active |
| US8674329B2 | Method and apparatus for analyzing and/or repairing of an EUV mask defect | Physics | 3 | Active |
| US10060947B2 | Method and apparatus for analyzing and for removing a defect of an EUV photomask | Physics | 3 | Active |
| US8316698B2 | Determining a repairing form of a defect at or close to an edge of a substrate of a photo mask | Emerging Cross-Sectional Technologies | 2 | Active |
| US10068747B2 | Methods and devices for examining an electrically charged specimen surface | Electricity | 2 | Active |
| US9910065B2 | Apparatus and method for examining a surface of a mask | Physics | 1 | Active |
| US9115981B2 | Apparatus and method for investigating an object | Electricity | 1 | Active |
| US10983075B2 | Device and method for analysing a defect of a photolithographic mask or of a wafer | Electricity | 1 | Active |
| US8058614B2 | Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof | Electricity | 1 | Active |
| US11874598B2 | Method and apparatuses for disposing of excess material of a photolithographic mask | Performing Operations; Transporting | 0 | Active |
| US11385540B2 | Apparatus and method for determining a position of an element on a photolithographic mask | Electricity | 0 | Active |
| US11592461B2 | Apparatus and method for examining and/or processing a sample | Electricity | 0 | Active |
| US11733186B2 | Device and method for analyzing a defect of a photolithographic mask or of a wafer | Electricity | 0 | Active |
| US12135540B2 | Devices and methods for examining and/or processing an element for photolithography | Electricity | 0 | Active |
| US11650495B2 | Apparatus and method for determining a position of an element on a photolithographic mask | Electricity | 0 | Active |
| US11262378B2 | Apparatus and method for examining and/or processing a sample | Electricity | 0 | Active |
| US9863760B2 | Method and device for determining a reference point of an orientation marking on a substrate of a photolithographic mask in an automated manner | Physics | 0 | Active |
| US11170970B2 | Methods and devices for examining an electrically charged specimen surface | Electricity | 0 | Active |
| US9431212B2 | Method for determining the performance of a photolithographic mask | Physics | 0 | Active |
| US12292680B2 | Method and apparatuses for disposing of excess material of a photolithographic mask | Performing Operations; Transporting | 0 | Active |
| US10410820B2 | Beam blanker and method for blanking a charged particle beam | Electricity | 0 | Active |
| US11256168B2 | Apparatus and method for repairing a photolithographic mask | Electricity | 0 | Active |
| US12164226B2 | Method and apparatuses for disposing of excess material of a photolithographic mask | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.