Resist composition, and method of forming resist pattern
US11256169B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 23, 2019 |
| Grant date | Feb 22, 2022 |
| Priority date | — |
| Expiry date | Feb 7, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2047
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx1 to Rx4, Ry1 to Ry2 and Rz1 to Rz4 has an anion group, the entire anion moiety may be an n-valent anion, and Mm+ represents an m-valent organic cation
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.