Detection method and system for pellicle membrane of photomask
US11256183B2 · kind B2 · utility
2Cited by
1References
9Claims
0Family size
Assignee
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Key dates
| Filing date | May 18, 2020 |
| Grant date | Feb 22, 2022 |
| Priority date | — |
| Expiry date | Jul 9, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A detection method for a pellicle membrane of a photomask includes applying a predetermined pressure under which the pellicle membrane undergoes a deformation, measuring and calculating at least one of deformation level, Young's modulus, and flexural rigidity level of the pellicle membrane by detection, and obtaining a detection result about the pellicle membrane according to at least one of the deformation level, Young's modulus, and flexural rigidity level of the pellicle membrane, so as to evaluate the quality of the pellicle membrane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.