Photomask, photolithography system and manufacturing process
US11262658B2 · kind B2 · utility
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10References
20Claims
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Key dates
| Filing date | Apr 28, 2020 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | Jun 24, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask includes a transparent substrate and a shielding pattern disposed on the transparent substrate. The shielding pattern includes shielding island structures. The shielding island structures are separated from and spaced apart from one another by dividing lanes. The dividing lanes expose the underlying transparent substrate. The photomask is configured for a light of a wavelength, and the dividing lanes reduce or hinder a transmission of the light of the wavelength.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.