Patent · US Active

Wafer level package

US11264354B2 · kind B2 · utility

1Cited by
8References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 8, 2020
Grant dateMar 1, 2022
Priority date
Expiry dateMay 8, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/3511
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Provided are a wafer level package and a method of manufacturing the same, wherein an underfill sufficiently fills a space between a redistribution substrate and a semiconductor chip, thereby reducing warpage. The wafer level package includes a redistribution substrate including at least one redistribution layer (RDL), a semiconductor chip on the redistribution substrate, and an underfill filling a space between the redistribution substrate and the semiconductor chip. The underfill covers side surfaces of the semiconductor chip. The redistribution substrate includes a trench having a line shape and extending in a first direction along a first side surface of the semiconductor chip.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.