Bake system and method of fabricating display device using the same
US11264571B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Oct 17, 2019 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | Feb 23, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/811
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A bake system may include a chamber having an internal space, a stage disposed in the internal space of the chamber and on which a target substrate is disposed, a gas ejection structure providing a process gas in the chamber, an exhaust structure, an atmosphere analyzer monitoring moisture and oxygen in the chamber, and a gas supplier controlling a flow rate of the process gas based on information provided from the atmosphere analyzer. The exhaust structure may include a suction part disposed in the internal space, and an exhaust part connected to the suction part and is disposed outside the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.