Katsushi Kishimoto
31Patents
8h-index
25Co-inventors
75Inventor score
Filing activity: Jun 11, 1999 → Oct 12, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6242686A | Photovoltaic device and process for producing the same | Emerging Cross-Sectional Technologies | 73 | Expired |
| US6525264B2 | Thin-film solar cell module | Emerging Cross-Sectional Technologies | 33 | Expired |
| US6383898B1 | Method for manufacturing photoelectric conversion device | Emerging Cross-Sectional Technologies | 33 | Expired |
| US7032536B2 | Thin film formation apparatus including engagement members for support during thermal expansion | Electricity | 12 | Expired |
| US9246377B2 | Apparatus for transferring substrate | Electricity | 10 | Active |
| US8137046B2 | Substrate transfer apparatus and substrate transfer method | Electricity | 9 | Active |
| US7979166B2 | Generation facility management system | Emerging Cross-Sectional Technologies | 9 | Active |
| US7927455B2 | Plasma processing apparatus | Electricity | 8 | Active |
| US8092640B2 | Plasma processing apparatus and semiconductor device manufactured by the same apparatus | Electricity | 7 | Expired |
| US7540257B2 | Plasma processing apparatus and semiconductor device manufactured by the same apparatus | Electricity | 6 | Active |
| US9543444B2 | Oxide sputtering target, and thin film transistor using the same | Electricity | 6 | Active |
| US7195673B2 | Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same | Chemistry; Metallurgy | 5 | Expired |
| US6979589B2 | Silicon-based thin-film photoelectric conversion device and method of manufacturing thereof | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7918939B2 | Semiconductor manufacturing apparatus and semiconductor manufacturing method using the same | Emerging Cross-Sectional Technologies | 2 | Active |
| US7565880B2 | Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same | Chemistry; Metallurgy | 2 | Active |
| US9799712B2 | Method of manufacturing light-emitting display device with reduced pressure drying | Electricity | 2 | Active |
| US9530622B2 | Sputtering device and gas supply pipe for sputtering device | Electricity | 1 | Active |
| US11211576B2 | Organic light emitting device and method of manufacturing the same | Electricity | 0 | Active |
| US9644270B2 | Oxide semiconductor depositing apparatus and method of manufacturing oxide semiconductor using the same | Electricity | 0 | Active |
| US8389389B2 | Semiconductor layer manufacturing method, semiconductor layer manufacturing apparatus, and semiconductor device manufactured using such method and apparatus | Emerging Cross-Sectional Technologies | 0 | Active |
| US10032927B2 | Oxide sputtering target, and thin film transistor using the same | Electricity | 0 | Active |
| US10032922B2 | Thin-film transistor with crystallized active layer, method of manufacturing the same, and organic light-emitting display device including the same | Electricity | 0 | Active |
| US9484200B2 | Oxide sputtering target, thin film transistor using the same, and method for manufacturing thin film transistor | Electricity | 0 | Active |
| US8395250B2 | Plasma processing apparatus with an exhaust port above the substrate | Electricity | 0 | Active |
| US11264571B2 | Bake system and method of fabricating display device using the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.