Method and system for calculating printed area metric indicative of stochastic variations of the lithographic process
US11270054B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 31, 2020 |
| Grant date | Mar 8, 2022 |
| Priority date | — |
| Expiry date | Aug 31, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/10
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Systems and methods for calculating a printed area metric indicative of stochastic variations of the lithographic process are disclosed. Lithography is a process that uses light to transfer a geometric pattern from a photomask, based on a layout design, to a resist on a substrate. The lithographic process is subject to random stochastic phenomena, with the resulting stochastic randomness potentially becoming a major challenge. To characterize the stochastic phenomena, a printed area metric may be generated analytically (rather than via simulations) and comprise one or more defined moments for a printed area distribution associated with the printed area that are indicative of one or more aspects associated with printing. For example, the printed area metric may be indicative of the likelihood of printing within the printed area or the variance of printing within the printed area due to stochastic randomness in one or both of exposure or resist process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.