Variable inlet conductance vacuum pump, vacuum pump arrangement and method
US11280340B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 8, 2019 |
| Grant date | Mar 22, 2022 |
| Priority date | — |
| Expiry date | Jan 23, 2040 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF05D2250/51
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A vacuum pump, vacuum pump arrangement and method are disclosed. The vacuum pump includes at least one rotor; and a stator, an inlet for receiving gas during operation; and an exhaust for exhausting the gas. The vacuum pump includes a shaft extending through a centre of said pump and comprising a plate mounted on an end of the shaft towards the inlet. The vacuum pump includes control circuitry configured to control an axial position of the plate, a change in axial position of the plate providing a change in inlet conductance of gas to the vacuum pump. The plate is mounted such that it extends beyond the inlet in at least some axial positions of the rotor such that the plate is not on the same side of the inlet as the stator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.