Methods and apparatus for detection and analysis of nanoparticles from semiconductor chamber parts
US11280717B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 7, 2017 |
| Grant date | Mar 22, 2022 |
| Priority date | — |
| Expiry date | Feb 6, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/6439
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatuses for identifying contaminants in a semiconductor cleaning solution, including: contacting a semiconductor cleaning solution with a semiconductor manufacturing component to form an effluent including one or more insoluble analytes-of-interest; contacting the effluent including one or more insoluble analytes-of-interest with an optical apparatus configured to sense fluorescence and, optionally, Raman signals from the one or more insoluble analytes-of-interest, wherein the apparatus includes an electron multiplying charged couple device and a grating spectrometer to spectrally disperse the fluorescence and project the fluorescence on to the electron multiplying charged couple device; and identifying the one or more analytes of interest.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.