Coding distance topologies for structured light patterns for 3D reconstruction
US11282220B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2020 |
| Grant date | Mar 22, 2022 |
| Priority date | — |
| Expiry date | Jun 28, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/10152
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Methods, systems, and devices for 3D measurement and/or pattern generation are provided in accordance with various embodiments. Some embodiments include a method of pattern projection that may include projecting one or more patterns. Each pattern from the one or more patterns may include an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement. Some embodiments further include: illuminating an object using the one or more projected patterns; collecting one or more images of the illuminated object; and/or computing one or more 3D locations of the illuminated object based on the one or more projected patterns and the one or more collected images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.