Mask blank for lithography and method of manufacturing the same
US11287754B2 · kind B2 · utility
0Cited by
11References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 21, 2020 |
| Grant date | Mar 29, 2022 |
| Priority date | — |
| Expiry date | Dec 21, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask for cleaning a lithography apparatus includes a mask substrate and a coating provided on a surface of the mask substrate. The coating is configured to trap particulate contaminant matter from the lithography apparatus. A method of cleaning a lithography tool is also provided preparing a cleaning mask including a particle trapping layer formed on a substrate. The method includes transferring the cleaning mask through a mask transferring route of the lithography tool. Subsequently, the method includes analyzing a particle trapped by the particle trapping layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.