Raman spectroscopy based measurement system
US11293871B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 15, 2018 |
| Grant date | Apr 5, 2022 |
| Priority date | — |
| Expiry date | May 15, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/06113
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: performing measurements on a patterned structure by illuminating the structure with exciting light to cause Raman scattering of one or more excited regions of the pattern structure, while applying a controlled change of at least temperature condition of the patterned structure, and detecting the Raman scattering, and generating corresponding measured data indicative of a temperature dependence of the detected Raman scattering; and analyzing the measured data and generating data indicative of spatial profile of one or more properties of the patterned structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.