Multi-radius magnetron for physical vapor deposition (PVD) and methods of use thereof

US11295938B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Jiao Song · Singapore, SG
• Anthony Chih-Tung Chan · Sunnyvale, US
• David Gunther · Weingarten, DE
• Kirankumar Neelasandra SAVANDAIAH · Bengaluru, IN
• Irena H. Wysok · San Jose, US

Key dates

• Filing date: Jun 30, 2020
• Grant date: Apr 5, 2022
• Expiry date: Jun 30, 2040

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/332
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Methods and apparatus for processing a substrate are provided herein. In embodiments, a magnetron assembly for use in a PVD chamber includes: a base plate having a first side, a second side opposite the first side, and a central axis; a magnet plate rotatably coupled to the base plate, wherein the magnet plate rotates with respect to the base plate about an offset axis; a magnet assembly coupled to the magnet plate offset from the offset axis and configured to rotate about the central axis and the offset axis; a first motor coupled to the base plate to rotate the magnet assembly about the central axis; and a second motor coupled to the magnet plate to control an angular position thereof and to position the magnet assembly in each of a plurality of fixed angular positions defining a plurality of different fixed radii.