Photoresist developer and method of developing photoresist
US11300878B2 · kind B2 · utility
4Cited by
14References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 28, 2018 |
| Grant date | Apr 12, 2022 |
| Priority date | — |
| Expiry date | Jul 16, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/47
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist developer includes a solvent having Hansen solubility parameters of 15<δd<25, 10<δp<25, and 6<δp<30; an acid having an acid dissociation constant, pKa, of −15<pKa<4, or a base having a pKa of 40>pKa>9.5; and a chelate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.