Method of adapting feed-forward parameters
US11300886B2 · kind B2 · utility
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Key dates
| Filing date | Jul 12, 2018 |
| Grant date | Apr 12, 2022 |
| Priority date | — |
| Expiry date | Jul 12, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for correcting values of one or more feed-forward parameters used in a process of patterning substrates, the method including: obtaining measured overlay and/or alignment error data of a patterned substrate; and calculating one or more correction values for the one or more feed-forward parameters in dependence on the measured overlay and/or alignment error data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.