Active matrix substrate and production method therefor
US11302718B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 11, 2018 |
| Grant date | Apr 12, 2022 |
| Priority date | — |
| Expiry date | Dec 14, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/40
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Each of pixel regions of an active matrix substrate (1002) includes: a lower insulating layer (5); an oxide semiconductor layer (7) that is arranged on the lower insulating layer and includes an active region (7a) of an oxide semiconductor TFT; an upper insulating layer (9) that is arranged on a portion of the oxide semiconductor layer so as not to be in contact with the lower insulating layer; an upper gate layer (10) that is arranged on the upper insulating layer and includes an upper gate electrode (10a) and one of a plurality of gate bus lines (GL); and a source electrode and a drain electrode, wherein: the oxide semiconductor layer 7 further includes an extension region (7e) that extends from the active region (7a) in a direction x different from a channel length direction y of the oxide semiconductor TFT as seen from a normal direction to the substrate; and the extension region (7e) is arranged on the substrate side of one of the plurality of gate bus lines (GL) with an upper insulating layer (9) interposed therebetween, and includes a portion that extends so as to overlap with the one of the plurality of gate bus lines.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.