Extreme ultraviolet light source systems
US11304287B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 20, 2021 |
| Grant date | Apr 12, 2022 |
| Priority date | — |
| Expiry date | May 20, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.