Method and system for reducing layout distortion due to exposure non-uniformity
US11308254B2 · kind B2 · utility
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10References
20Claims
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Key dates
| Filing date | Jul 23, 2020 |
| Grant date | Apr 19, 2022 |
| Priority date | — |
| Expiry date | Jul 23, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/20
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method, a non-transitory computer-readable storage medium and a system for adjusting a design layout are provided. The method includes: receiving a design layout including a feature in a peripheral region of the design layout; determining a first compensation value associated with the peripheral region according to an exposure distribution in an exposure field of a workpiece; and adjusting the design layout by modifying a shape of the feature according to the compensation value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.