Electro static chuck
US11309206B2 · kind B2 · utility
0Cited by
13References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 2020 |
| Grant date | Apr 19, 2022 |
| Priority date | — |
| Expiry date | Jan 17, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6833
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed is an electro static chuck. Disclosed is an electro static chuck which includes: a base substrate; and an electro static chuck plate fixed onto the base substrate and including a plurality of electrodes to which biases for chucking and dechucking are applied, in which the plurality of electrodes includes a spiral pattern extending from a start point of an edge of the electro static chuck plate toward an end point of a center and a rotational angle of the spiral pattern is 360°n (n is a real number of 1 to 2).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.