Patent · US Active

Electromigration resistant and profile consistent contact arrays

US11309239B2 · kind B2 · utility

1Cited by
2References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 20, 2020
Grant dateApr 19, 2022
Priority date
Expiry dateOct 20, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/3651
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A package assembly includes a substrate and at least a first die having a first contact array and a second contact array. First and second via assemblies are respectively coupled with the first and second contact arrays. Each of the first and second via assemblies includes a base pad, a cap assembly, and a via therebetween. One or more of the cap assembly or the via includes an electromigration resistant material to isolate each of the base pad and the cap assembly. Each first cap assembly and via of the first via assemblies has a first assembly profile less than a second assembly profile of each second cap assembly and via of the second via assemblies. The first and second cap assemblies have a common applied thickness in an application configuration. The first and second cap assemblies have a thickness variation of ten microns or less in a reflowed configuration.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.