Non-aqueous tungsten compatible metal nitride selective etchants and cleaners
US11319513B2 · kind B2 · utility
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Key dates
| Filing date | Mar 23, 2017 |
| Grant date | May 3, 2022 |
| Priority date | — |
| Expiry date | May 27, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31144
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Provided therefore herein is a novel acidic fluoride activated cleaning chemistry. The present invention includes novel acidic fluoride activated, unique organic-solvent based microelectronic selective etchant/cleaner compositions with high metal nitride etch and broad excellent compatibility, including tungsten (W) and low-k. It does not use W-incompatible oxidizers, such as hydrogen peroxide or particle-generating corrosion inhibitors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.