Patent · US Active

Method and device for characterizing the surface shape of an optical element

US11326872B2 · kind B2 · utility

0Cited by
4References
19Claims
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Key dates

Filing dateJan 15, 2021
Grant dateMay 10, 2022
Priority date
Expiry dateJan 15, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B2290/70
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and a device for characterizing the surface shape of an optical element. In the method, in at least one interferogram measurement carried out by an interferometric test arrangement, a test wave reflected at the optical element is caused to be superimposed with a reference wave not reflected at the optical element. In this case, the figure of the optical element is determined on the basis of at least two interferogram measurements using electromagnetic radiation having in each case linear input polarization or in each case circular input polarization, wherein the input polarizations for the two interferogram measurements differ from one another.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.